Beamlines

ADRESS

cSAXS

IR

MicroXAS

MS

PolLux

PXI

PXII

PXIII

SIM
Beamline status
Operation
Safety
Contact Nos.
Staff
Layout
Source
Optics
Endstations
Software
Primers
Research
Publications SIM
Publications MM
Computing
Manual

SIS

SuperXAS

TOMCAT

VUV

XIL

Controls

Optics
 


WBE 1.0 © 2002 SLS/PSI



IntroScience, R&DBeamlinesEventsUsersOperationAcceleratorsPSI
Home/beamlines/sim/index.html
test2



 



       
   
Surfaces / Interfaces Microscopy X11MA
 
       



General description and specifications

 

Energy range:

90-2000 eV

Flux (10 keV):

1 x 1015 ph/s/0.1%BW/0.4 A

Focused spot size:

30 µm x 100 µm (VxH)

Spectral resolution

>5000

Polarization

Linear (0 deg/horizontal to 90 deg/vertical)

Circular (right/left)

End-station ES1

Photoemission electron microscope with

spatial resolution=100 nm,
variable sample temperature:120-1'800 K.

End-station ES3

XMCD chamber for TEY measurements in applied field

(130 mT) and variable sample temperature (15-300 K).

This small XMCD chamber is currently not available (2008). Instead, the TBT is as User endstation at the SIM beamline.

End-station ES4

Presently RESOXS, NNPEH. (These endstations belong to a user group and can only be used in collaboration with them)

The SIM beamline produces a high flux of soft X-rays from an undulator source. The beamline has one endstation open to user via the SLS proposals system:

  • PhotoEmission Electron Microscopy (PEEM)

The permanent endstation of the SIM beamline is a Photoemission Electron microscope (PEEM) (Model: LEEM III, Elmitec GmbH). It allows to image samples using the photoelectric effect with very high spatial resolution. With an additional energy analyzer these photoelectrons can be energy-selected. In addition to illumination by X-rays, illumination by low energy electrons is possible. In this low energy electron microscopy (LEEM) mode additional contrast mechanisms are available. The PEEM is equipped with a small preparation chamber (sputtering, heating, load-lock). In addition, a more complete preparation system is available with a load-lock, LEED and Auger, several evaporation sources, rotatable electromagnetic coil, ion etching and electron bombardment heating.

In addition, Users can apply for beamtime with their own endstation (after prior consulation with the beamline scientist).